The precise control of feature sizes exhibits great importance in fabricating nanodevices for optoelectronics, plasmonics, meta-optics, and biosciences, just to name a few. Some applications require ...

ESOL has developed a standalone interference extreme ultraviolet (EUV) lithography tool for use in R&D applications. The system, called EMiLE (EUV Micro-interference Lithography Equipment), is primary ...

M. K. Sears, J. Bekaert, B. W. Smith, "Pupil wavefront manipulation for optical nanolithography", Proc. SPIE 8326, (2012) paper M. K. Sears, G. Fenger, J. Mailfert, B ...

Michal Lipson and pals at Cornell University and Xiang Zhang and buddies at UC Berkeley say they have both built cloaks that are essentially mirrors with a tiny bump in which an object can hide. The ...

ILSim is a compact, multi-beam interference lithography simulator. ILSim is based on full vector interference theory, which allows for application at extremely high NA values, such as those projected ...

This imaging performance enables imec’s ecosystem of resist and patterning partners to utilize the NXE:3400B as a platform for early material development for future process nodes that will be enabled ...

Researchers from the Paul Scherrer Institute, Laboratory of X-ray Nanoscience and Technologies, developed a method for producing denser circuit patterns. Modern microchips feature conductive tracks ...

The surface of a silicon wafer is so smooth that it produces an almost perfect mirror image, as demonstrated here by Iason Giannopoulos (left) and Dimitrios Kazazis. Researchers at the Paul Scherrer ...